We describe an analytical method to calculate the strain field and the corresponding band gap modulation induced in a quantum well by a surface stressor of arbitrary shape. In this way, it is possible to engineer the confinement potential of different strained nanostructures based on patterned heterojunctions. Band gap modulations up to 130-140 meV are predicted for suitably designed II-VI/III-V and III-V/III-V heterostructures.

Engineering the strain field for the control of quantum confinement: An analytical model for arbitrary shape nanostructures

M Mazzer;M De Giorgi;E Molinari
1998

Abstract

We describe an analytical method to calculate the strain field and the corresponding band gap modulation induced in a quantum well by a surface stressor of arbitrary shape. In this way, it is possible to engineer the confinement potential of different strained nanostructures based on patterned heterojunctions. Band gap modulations up to 130-140 meV are predicted for suitably designed II-VI/III-V and III-V/III-V heterostructures.
1998
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
84
7
3437
3441
http://jap.aip.org/resource/1/japiau/v84/i7/p3437_s1
6
info:eu-repo/semantics/article
262
Mazzer, M; DE GIORGI, Milena; Cingolani, R; Porello, G; Rossi, F; Molinari, E
01 Contributo su Rivista::01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/200090
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