The Mo-W-O thin films were deposited by RF reactive sputtering from composite target of W and Mo (20:80 weight ratio). Structural characterisation was carried out by X-ray diffraction spectroscopy and the composition of the film was obtained by Rutherford backscattering analysis. The layers were investigated by volt-amperometric technique for electrical and gas-sensing properties. The films were capable of sensing CO. No effect of poisoning of the surface was recorded and recovery of the resistance was complete. A concentration of CO as low as 15 ppm produced a relative variation in the conductance of 390% with response and recovery times of about 2 minutes at a working temperature of 200°C.

Mo-W-O thin films for CO sensing

Vomiero A;
2001

Abstract

The Mo-W-O thin films were deposited by RF reactive sputtering from composite target of W and Mo (20:80 weight ratio). Structural characterisation was carried out by X-ray diffraction spectroscopy and the composition of the film was obtained by Rutherford backscattering analysis. The layers were investigated by volt-amperometric technique for electrical and gas-sensing properties. The films were capable of sensing CO. No effect of poisoning of the surface was recorded and recovery of the resistance was complete. A concentration of CO as low as 15 ppm produced a relative variation in the conductance of 390% with response and recovery times of about 2 minutes at a working temperature of 200°C.
2001
Annealing
Carbon monoxide
Chemical sensors
Molybdenum compounds
Rutherford backscattering spectroscopy
Sputter deposition
Sublimation
X ray diffraction analysis
X ray spectroscopy
Volt-amperometric techniques
Thin films
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/20123
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