The Mo-W-O thin films were deposited by RF reactive sputtering from composite target of W and Mo (20:80 weight ratio). Structural characterisation was carried out by X-ray diffraction spectroscopy and the composition of the film was obtained by Rutherford backscattering analysis. The layers were investigated by volt-amperometric technique for electrical and gas-sensing properties. The films were capable of sensing CO. No effect of poisoning of the surface was recorded and recovery of the resistance was complete. A concentration of CO as low as 15 ppm produced a relative variation in the conductance of 390% with response and recovery times of about 2 minutes at a working temperature of 200°C.
Mo-W-O thin films for CO sensing
Vomiero A;
2001
Abstract
The Mo-W-O thin films were deposited by RF reactive sputtering from composite target of W and Mo (20:80 weight ratio). Structural characterisation was carried out by X-ray diffraction spectroscopy and the composition of the film was obtained by Rutherford backscattering analysis. The layers were investigated by volt-amperometric technique for electrical and gas-sensing properties. The films were capable of sensing CO. No effect of poisoning of the surface was recorded and recovery of the resistance was complete. A concentration of CO as low as 15 ppm produced a relative variation in the conductance of 390% with response and recovery times of about 2 minutes at a working temperature of 200°C.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
