The preparation thin films of Mo and W mixed oxides by reactive sputtering, assisted by the selective sublimation processing technique was discussed. Diffusion of Mo ions towards the film surface and sublimation of MoO 3 were observed. The analysis showed that the presence of dispersed Mo and W anion in the WO3 or MoO3 phases inhibited grain coalescence upon annealing.

Selective sublimation processing of a molybdenum-tungsten mixed oxide thin film

Vomiero;
2003

Abstract

The preparation thin films of Mo and W mixed oxides by reactive sputtering, assisted by the selective sublimation processing technique was discussed. Diffusion of Mo ions towards the film surface and sublimation of MoO 3 were observed. The analysis showed that the presence of dispersed Mo and W anion in the WO3 or MoO3 phases inhibited grain coalescence upon annealing.
2003
Annealing
Molybdenum
Negative ions
Oxides
Sputtering
Sublimation
Tungsten
Reactive sputtering
Thin films
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/20202
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