The preparation thin films of Mo and W mixed oxides by reactive sputtering, assisted by the selective sublimation processing technique was discussed. Diffusion of Mo ions towards the film surface and sublimation of MoO 3 were observed. The analysis showed that the presence of dispersed Mo and W anion in the WO3 or MoO3 phases inhibited grain coalescence upon annealing.

Selective sublimation processing of a molybdenum-tungsten mixed oxide thin film

Vomiero;
2003

Abstract

The preparation thin films of Mo and W mixed oxides by reactive sputtering, assisted by the selective sublimation processing technique was discussed. Diffusion of Mo ions towards the film surface and sublimation of MoO 3 were observed. The analysis showed that the presence of dispersed Mo and W anion in the WO3 or MoO3 phases inhibited grain coalescence upon annealing.
2003
Inglese
21
4
1442
1448
http://www.scopus.com/inward/record.url?eid=2-s2.0-0141458225&partnerID=40&md5=279da932f14e14f2127882fa9ca23221
Annealing
Molybdenum
Negative ions
Oxides
Sputtering
Sublimation
Tungsten
Reactive sputtering
Thin films
cited By (since 1996)9
1
info:eu-repo/semantics/article
262
Ferroni; M.a;Guidi; V.b;Comini; E.c;Sberveglieri; G.c;Vomiero; A.d e;Delia Mea; G.d e;Martinelli; G.f
01 Contributo su Rivista::01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/20202
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