Sequential double ion implantation in silicate glasses has been used to realize copper-nickel alloy nanoclusters embedded in the host dielectric matrix. A grazing incidence small-angle X-ray scattering experiment has been performed on copper+nickel implanted silicate glasses, to obtain information on the cluster size and size distribution, as well as on the volume fraction. The potential of the technique in the study of these composite glasses is discussed.
GISAXS study of Cu-Ni alloy clusters obtained by double ion implantation in silicate glasses
2000
Abstract
Sequential double ion implantation in silicate glasses has been used to realize copper-nickel alloy nanoclusters embedded in the host dielectric matrix. A grazing incidence small-angle X-ray scattering experiment has been performed on copper+nickel implanted silicate glasses, to obtain information on the cluster size and size distribution, as well as on the volume fraction. The potential of the technique in the study of these composite glasses is discussed.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
