A study of amorphous and polycrystalline silicon films deposited at different temperatures is presented. The effect of surface roughness on the quality of the fits to the spectroscopic ellipsometry data is assessed through a comparison with complementary atomic force microscopy images.
Influence of roughness and grain dimension on the optical functions of polycrystalline silicon films
G Tallarida;
1998
Abstract
A study of amorphous and polycrystalline silicon films deposited at different temperatures is presented. The effect of surface roughness on the quality of the fits to the spectroscopic ellipsometry data is assessed through a comparison with complementary atomic force microscopy images.File in questo prodotto:
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