The selection of optimal conditions for preparing TIC coatings on oriented silicon, based on PLAD technique, was carried out by applying surface analysis (SEM, EDS, XPS, image analysis) on a series of films realised under different processing conditions. Consideration were made on the film characteristics as a function of laser fluence and informations, about the physico-chemical aspects of the ablation phenomena, were obtained. (C) 1998 Elsevier Science B.V. All rights reserved.
Silicon supported TiC films produced by pulsed laser ablation
A Santagata;B Brunetti;
1998
Abstract
The selection of optimal conditions for preparing TIC coatings on oriented silicon, based on PLAD technique, was carried out by applying surface analysis (SEM, EDS, XPS, image analysis) on a series of films realised under different processing conditions. Consideration were made on the film characteristics as a function of laser fluence and informations, about the physico-chemical aspects of the ablation phenomena, were obtained. (C) 1998 Elsevier Science B.V. All rights reserved.File in questo prodotto:
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