By combining tight-binding molecular dynamics and restricted Hartree-Fock calculations we present a quantitative picture for chemical bond in silicon when point defects are present.

A Theoretical investigation on the chemical bonding of interstitial and vacancy defects in silicon during their migration

F Cargnoni;C Gatti
1997

Abstract

By combining tight-binding molecular dynamics and restricted Hartree-Fock calculations we present a quantitative picture for chemical bond in silicon when point defects are present.
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Descrizione: A Theoretical investigation on the chemical bonding of interstitial and vacancy defects in silicon during their migration
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/207801
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