We here review how the most common intrinsic defects and dopants modify the electronic properties of ZnO, providing novel results obtained by means of accurate first principles density functional calculations. In particular, we show that interstitial H is responsible for the residual and hardly eliminable n-type character of real ZnO samples. We also show the effects of controlled doping with metal ions to obtain both transparent conductive oxides (Al, Ga, In) and p-type materials (Ag). We demonstrate that Ag inclusions can be linked to the presence of deep acceptors in the host band gap that may cancel the p-type character in Ag-doped ZnO.

First principles description of the electronic properties of doped ZnO

A Catellani;A Ruini;A Calzolari
2013

Abstract

We here review how the most common intrinsic defects and dopants modify the electronic properties of ZnO, providing novel results obtained by means of accurate first principles density functional calculations. In particular, we show that interstitial H is responsible for the residual and hardly eliminable n-type character of real ZnO samples. We also show the effects of controlled doping with metal ions to obtain both transparent conductive oxides (Al, Ga, In) and p-type materials (Ag). We demonstrate that Ag inclusions can be linked to the presence of deep acceptors in the host band gap that may cancel the p-type character in Ag-doped ZnO.
2013
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Istituto Nanoscienze - NANO
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/212375
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 17
  • ???jsp.display-item.citation.isi??? ND
social impact