The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma produced by a magnetron sputtering device. The magnetic field has been mapped by measuring the axial and radial components with Hall probes. The plasma parameters have been measured by a diagnostic system consisting of several Langmuir probes with different collecting areas that can be positioned by a linear translator. The automatic analysis system allows one to take into account non-saturation of the ion current due to sheath thickness variation. The Langmuir probes have been used in various conditions of magnetic field and source power with a gas filling pressure of 1 Pa. It has been found that the diagnostic system gives reliable measurements of the plasma parameters in static and inhomogeneous magnetic fields. (C) 1999 Elsevier Science S.A. All rights reserved.

Automatic Langmuir probe measurement in a magnetron sputtering system

Spolaore M;Antoni V;Martines E;Pomaro N;Serianni G;
1999

Abstract

The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma produced by a magnetron sputtering device. The magnetic field has been mapped by measuring the axial and radial components with Hall probes. The plasma parameters have been measured by a diagnostic system consisting of several Langmuir probes with different collecting areas that can be positioned by a linear translator. The automatic analysis system allows one to take into account non-saturation of the ion current due to sheath thickness variation. The Langmuir probes have been used in various conditions of magnetic field and source power with a gas filling pressure of 1 Pa. It has been found that the diagnostic system gives reliable measurements of the plasma parameters in static and inhomogeneous magnetic fields. (C) 1999 Elsevier Science S.A. All rights reserved.
1999
Istituto gas ionizzati - IGI - Sede Padova
Inglese
116
1083
1088
6
http://ac.els-cdn.com/S025789729900122X/1-s2.0-S025789729900122X-main.pdf?_tid=95d5a416-34ed-11e3-b070-00000aacb361&acdnat=1381768257_b2cf21f88e0eb8eb532fc4325a291914
Sì, ma tipo non specificato
Electron temperature
Ion density
Langmuir probe
Magnetron sputtering
ISI Document Delivery No.: 259VG Times Cited: 12 Cited Reference Count: 10 Spolaore, M Antoni, V Bagatin, M Buffa, A Cavazzana, R Desideri, D Martines, E Pomaro, N Serianni, G Tramontin, L 6th International Conference on Plasma Surface Engineering (PSE 98) Sep 14-18, 1998 Garmisch partenki, germany European Joint Comm Plasma & Ion Surface Engn Martines, Emilio/B-1418-2009 Martines, Emilio/0000-0002-4181-2959 12 Elsevier science sa Lausanne. La rivista è pubblicata anche online con ISSN 1879-3347.
10
info:eu-repo/semantics/article
262
Spolaore, M; Antoni, V; Bagatin, M; Buffa, A; Cavazzana, R; Desideri, D; Martines, E; Pomaro, N; Serianni, G; Tramontin, L
01 Contributo su Rivista::01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/212418
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