Nanocrystalline TiNi thin films were produced by cluster beam deposition. A pulsed arc gas aggregation source was used to generate intense and stable supersonic cluster beams. With this technique, films characterized by crystallite sizes of a few tens of nanometers can be obtained without recrystallization by thermal annealing. Films maintain the stoichiometry of the original TiNi alloy. Oxygen contamination is observed.
Synthesis of nanocrystalline TiNi thin films by cluster beam deposition
S Iannotta;
1998
Abstract
Nanocrystalline TiNi thin films were produced by cluster beam deposition. A pulsed arc gas aggregation source was used to generate intense and stable supersonic cluster beams. With this technique, films characterized by crystallite sizes of a few tens of nanometers can be obtained without recrystallization by thermal annealing. Films maintain the stoichiometry of the original TiNi alloy. Oxygen contamination is observed.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
