An integrated interferometric temperature sensor, realized on a silicon substrate, is presented. The device consists of an array of planar Fabry-Pérot waveguiding cavities realized by plasma etching and standard microelectronic techniques. Experimental data demonstrating the monitoring of temperature variation both in modulus and sign, with a resolution of approximately 1°C, are reported. The influence of the cavity losses and size on the sensor performance is discussed. The realization of amorphous silicon-based guided-wave sensors is then suggested to obtain better temperature resolution.

An integrated silicon interferometric temperature sensor

1997

Abstract

An integrated interferometric temperature sensor, realized on a silicon substrate, is presented. The device consists of an array of planar Fabry-Pérot waveguiding cavities realized by plasma etching and standard microelectronic techniques. Experimental data demonstrating the monitoring of temperature variation both in modulus and sign, with a resolution of approximately 1°C, are reported. The influence of the cavity losses and size on the sensor performance is discussed. The realization of amorphous silicon-based guided-wave sensors is then suggested to obtain better temperature resolution.
1997
Amorphous silicon
Fabry-Perot interferometers
Microelectronic processing
Plasma etching
Substrates
Integrated interferometric temperature sensors
Sensors
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/217666
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