Thin film (40–600 nm) yttria-stabilized zirconia (YSZ) electrolytes for solid oxide fuel cells (SOFC) were deposited on NiO-YSZ anodes and fused silica substrates by RF sputtering, using low applied power without the use of post deposition annealing heat treatment. YSZ film showed a nanocrystalline structure and consisted of the Zr.85Y.15O1.93 (fcc) phase. The film was dense and the YSZ/anode interface was continuous and crack free. According to preliminary in-plane conductivity measurements (temperature range 550–750 °C) on the YSZ film, the activation energy for ionic conduction was found to be 1.18±0.01 eV.

Yttria-stabilized zirconia thin film electrolyte produced by RF sputtering for solid oxide fuel cell applications

Boldrini S;Doubova L;
2010

Abstract

Thin film (40–600 nm) yttria-stabilized zirconia (YSZ) electrolytes for solid oxide fuel cells (SOFC) were deposited on NiO-YSZ anodes and fused silica substrates by RF sputtering, using low applied power without the use of post deposition annealing heat treatment. YSZ film showed a nanocrystalline structure and consisted of the Zr.85Y.15O1.93 (fcc) phase. The film was dense and the YSZ/anode interface was continuous and crack free. According to preliminary in-plane conductivity measurements (temperature range 550–750 °C) on the YSZ film, the activation energy for ionic conduction was found to be 1.18±0.01 eV.
2010
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
Thin films
Ceramics
Microstructure
Nanomaterials
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/22173
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