A new approach for microfluidics- based production of polymeric particles, namely two- photon continuous flow lithography, is reported. This technique takes advantage of two- photon lithography to create objects with sub- micrometer and 3D features, and overcomes the traditional process limitations of two- photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow- tie particles with sub- diffraction resolution and surface roughness as low as 10 nm are demonstrated.
Two-Photon Continuous Flow Lithography
A Camposeo;D Pisignano
2012
Abstract
A new approach for microfluidics- based production of polymeric particles, namely two- photon continuous flow lithography, is reported. This technique takes advantage of two- photon lithography to create objects with sub- micrometer and 3D features, and overcomes the traditional process limitations of two- photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow- tie particles with sub- diffraction resolution and surface roughness as low as 10 nm are demonstrated.File in questo prodotto:
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