Hybrid 1-D dielectric microcavity fabricated by rf-sputtering and solution processed technique

1-D multilayer dielectric microcavity was fabricated by a hybrid radiofrequency-sputtering/solution deposition process. A fabrication protocol was defined with the aim to combine the high reproducibility allowed by the sputtering deposition for the fabrication of multilayers structures with the ability of fabricate films activated with highly luminescent quantum dots dispersed in polymeric matrix. The cavity was constituted by PMMA polymer matrix containing CdSe@ZnS quantum dots inserted between two BRs consisting of ten pairs of SiO2/TiO2 layers fabricated by rf-sputtering on SiO2 substrate. The thicknesses of the films of the BRs were tailored in order to reflect the visible radiation at around 650 nm. Transmittance spectra were employed to assess the optical features of the single Bragg gratings and whole sample. Luminescence measurements put in evidence an emission in the visible region at around 633 nm strongly influenced by the presence of the cavity with spectral feature that suggest the possibility of coherent emission.