In this work, the role of a chemical parameter, such as the degree of fluorination, on the wetting behavior of nanotextured hydrophobic surfaces is investigated. Texture and chemistry tuning of the surfaces has been accomplished with single batch radiofrequency low-pressure plasma processes. Polystyrene substrates have been textured by CF4 plasma etching and subsequently covered by thin films with a tunable F-to-C ratio, obtained in discharges fed with C4F8-C2H4. Measurements of wetting dynamics reveal a regime transition from adhesive-hydrophobic to slipperysuperhydrophobic, i.e., from wet to non wet states, as the F-to-C rises at constant topography. Such achievements are strengthened by calculation of the solid fraction of surface water contact area applying Cassie-Baxter advancing and receding equations to water contact angle data of textured and flat reference surfaces
Influence of Chemistry on Wetting Dynamics of Nanotextured Hydrophobic Surfaces
Fabio Palumbo;
2010
Abstract
In this work, the role of a chemical parameter, such as the degree of fluorination, on the wetting behavior of nanotextured hydrophobic surfaces is investigated. Texture and chemistry tuning of the surfaces has been accomplished with single batch radiofrequency low-pressure plasma processes. Polystyrene substrates have been textured by CF4 plasma etching and subsequently covered by thin films with a tunable F-to-C ratio, obtained in discharges fed with C4F8-C2H4. Measurements of wetting dynamics reveal a regime transition from adhesive-hydrophobic to slipperysuperhydrophobic, i.e., from wet to non wet states, as the F-to-C rises at constant topography. Such achievements are strengthened by calculation of the solid fraction of surface water contact area applying Cassie-Baxter advancing and receding equations to water contact angle data of textured and flat reference surfacesI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
