This paper deals with the GC-MS investigation of the exhaust gas of atmospheric pressure PE-CVD processes in organosilicon- and fluorocarbon-containing dielectric barrier discharges. The extent of unreacted monomer and the quali-quantitative distribution of by-products have been investigated as a function of the feed composition. The results confirm that GC-MS is a powerful indirect diagnostic technique of the plasma phase since it allows to hypothesize some of the reactive moieties formed in the plasma and to clarify some aspects of the deposition mechanism.
GC-MS Investigation of Organosilicon and Fluorocarbon Fed Plasmas
F Fanelli;F Fracassi;R d'Agostino
2011
Abstract
This paper deals with the GC-MS investigation of the exhaust gas of atmospheric pressure PE-CVD processes in organosilicon- and fluorocarbon-containing dielectric barrier discharges. The extent of unreacted monomer and the quali-quantitative distribution of by-products have been investigated as a function of the feed composition. The results confirm that GC-MS is a powerful indirect diagnostic technique of the plasma phase since it allows to hypothesize some of the reactive moieties formed in the plasma and to clarify some aspects of the deposition mechanism.File in questo prodotto:
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