The influence of the preparation conditions, including substrate functionalization with common silanizers, onto structure/morphology of the overlying poly(3-hexylthiophene) thin films has been investigated by using both grazing incidence X-ray diffraction and atomic force microscopy. The factors determining the formation of spin-coated films suitable for applications in field effect transistors, i.e. concentration, spin-speed, and thermal treatment are addressed. We have established, by a tuning of the preparation and postdeposition treatments, the optimal conditions to get films with the required structural/ morphologic features. Moreover we have shown that the macromolecules orient and organize at the interface zone (610 nm from the interface) better than in the upper layers, i.e. far away from the interface.

Structure and morphology optimization of poly(3-hexylthiophene) thin films onto silanized silicon oxide

Scavia G;Barba L;Arrighetti G;Milita S;Porzio W
2012

Abstract

The influence of the preparation conditions, including substrate functionalization with common silanizers, onto structure/morphology of the overlying poly(3-hexylthiophene) thin films has been investigated by using both grazing incidence X-ray diffraction and atomic force microscopy. The factors determining the formation of spin-coated films suitable for applications in field effect transistors, i.e. concentration, spin-speed, and thermal treatment are addressed. We have established, by a tuning of the preparation and postdeposition treatments, the optimal conditions to get films with the required structural/ morphologic features. Moreover we have shown that the macromolecules orient and organize at the interface zone (610 nm from the interface) better than in the upper layers, i.e. far away from the interface.
2012
Istituto di Cristallografia - IC
Istituto per la Microelettronica e Microsistemi - IMM
Istituto per lo Studio delle Macromolecole - ISMAC - Sede Milano
Polymer science
Structure and orientation
Surface interactions
Atomic force microscopy
Synchrotron radiation
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/229070
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