High-purity epitaxial FeSe(0.5)Te (0.5) thin films with different thicknesses were grown by pulsed laser ablation on different substrates. By varying the film thickness, T (c) values of up to 21 K were observed, significantly larger than the bulk value. Structural analyses indicated that the a axis changes significantly with the film thickness and is linearly related to T (c). The latter result indicates the important role of the compressive strain in enhancing T (c): the compressive strain derives from the Volmer-Weber growth of the films. The critical temperature is also related to both the Fe-(Se,Te) bond length and angle, suggesting the possibility of further enhancement.

Critical temperature enhancement by biaxial compressive strain in FeSe0.5Te0.5 thin films

E Bellingeri;I Pallecchi;R Buzio;A Gerbi;M Putti;S Kaciulis;C Ferdeghini
2011

Abstract

High-purity epitaxial FeSe(0.5)Te (0.5) thin films with different thicknesses were grown by pulsed laser ablation on different substrates. By varying the film thickness, T (c) values of up to 21 K were observed, significantly larger than the bulk value. Structural analyses indicated that the a axis changes significantly with the film thickness and is linearly related to T (c). The latter result indicates the important role of the compressive strain in enhancing T (c): the compressive strain derives from the Volmer-Weber growth of the films. The critical temperature is also related to both the Fe-(Se,Te) bond length and angle, suggesting the possibility of further enhancement.
2011
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
Istituto Superconduttori, materiali innovativi e dispositivi - SPIN
Thin films; Epitaxial growth; Strain
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/22964
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