For the first time a top-down process was used to control the spatial location of Metal-Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol-gel surface, with exposure hardening the sol-gel by inducing crosslinking while leaving the frameworks intact. © 2012 The Royal Society of Chemistry.
Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography
Grenci G;
2012
Abstract
For the first time a top-down process was used to control the spatial location of Metal-Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol-gel surface, with exposure hardening the sol-gel by inducing crosslinking while leaving the frameworks intact. © 2012 The Royal Society of Chemistry.File in questo prodotto:
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