The ability to engineer nearly perfect ultrathin oxide layers, up to the limit of monolayer thickness, is a key issue for nanotechnological applications. Here we face the difficult and important case of ultrathin MgO films on Ag(100), for which no extended and well-ordered layers could thus far be produced in the monolayer limit. We demonstrate that their final morphology depends not only on the usual growth parameters (crystal temperature, metal flux, and oxygen partial pressure), but also on aftergrowth treatments controlling so far neglected thermodynamics constraints. We thus succeed in tuning the shape of the oxide films from irregular, nanometer-sized, monolayer-thick islands to slightly larger, perfectly squared, bilayer islands, to extended monolayers limited apparently only by substrate steps.

Morphology of Monolayer MgO Films on Ag(100): Switching from Corrugated Islands to Extended Flat Terraces

Smerieri Marco;Savio Letizia;Vattuone Luca;
2014

Abstract

The ability to engineer nearly perfect ultrathin oxide layers, up to the limit of monolayer thickness, is a key issue for nanotechnological applications. Here we face the difficult and important case of ultrathin MgO films on Ag(100), for which no extended and well-ordered layers could thus far be produced in the monolayer limit. We demonstrate that their final morphology depends not only on the usual growth parameters (crystal temperature, metal flux, and oxygen partial pressure), but also on aftergrowth treatments controlling so far neglected thermodynamics constraints. We thus succeed in tuning the shape of the oxide films from irregular, nanometer-sized, monolayer-thick islands to slightly larger, perfectly squared, bilayer islands, to extended monolayers limited apparently only by substrate steps.
2014
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/230959
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