Hydrogen plasma pretreatment is used to enforce the growth of vertically-aligned carbon nanotube forests on TiN substrates. The evolution of the substrate, catalyst, and nanotubes are studied by in situ and ex-situ photoemission and X-ray diffraction in order to understand the growth mechanism. We find that TiN retains its crystallographic structure and its conductivity during plasma pretreatment and nanotube growth, which is confirmed by electrical measurements. Plasma pretreatment is found to favor the growth of nanotube forests by root growth, as it binds the catalyst nanoparticles more strongly to the substrate than thermal pretreatment. We find that plasma pretreatment time should be limited, otherwise poor or no growth is found. VC

Use of plasma treatment to grow carbon nanotube forests on TiN substrate

S Bhardwaj;C Cepek;
2011

Abstract

Hydrogen plasma pretreatment is used to enforce the growth of vertically-aligned carbon nanotube forests on TiN substrates. The evolution of the substrate, catalyst, and nanotubes are studied by in situ and ex-situ photoemission and X-ray diffraction in order to understand the growth mechanism. We find that TiN retains its crystallographic structure and its conductivity during plasma pretreatment and nanotube growth, which is confirmed by electrical measurements. Plasma pretreatment is found to favor the growth of nanotube forests by root growth, as it binds the catalyst nanoparticles more strongly to the substrate than thermal pretreatment. We find that plasma pretreatment time should be limited, otherwise poor or no growth is found. VC
2011
Istituto Officina dei Materiali - IOM -
carbon nanotubes
chemical vapour deposition
TiN
interconnect
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/234492
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