We used in-situ X-ray Photoelectron Spectroscopy (XPS) to study the oxidation process of a clusterassembled metallic titanium film exposed to molecular oxygen at room temperature. The nanostructured film has been grown on a Si(111) substrate, in ultra high vacuum conditions, by coupling a supersonic cluster beam deposition system with an XPS experimental chamber. Our results show that upon in-situ oxygen exposure Ti3+ is the first oxidation state observed, followed by Ti4+, whereas Ti2+ is practically absent during the whole process. Our results compare well with the existing literature on Ti films produced using other techniques.
Oxidation of nanostructured Ti films produced by low energy cluster beam deposition: An X-ray Photoelectron Spectroscopy characterization
Monica de Simone;Marcello Coreno;Cinzia Cepek
2012
Abstract
We used in-situ X-ray Photoelectron Spectroscopy (XPS) to study the oxidation process of a clusterassembled metallic titanium film exposed to molecular oxygen at room temperature. The nanostructured film has been grown on a Si(111) substrate, in ultra high vacuum conditions, by coupling a supersonic cluster beam deposition system with an XPS experimental chamber. Our results show that upon in-situ oxygen exposure Ti3+ is the first oxidation state observed, followed by Ti4+, whereas Ti2+ is practically absent during the whole process. Our results compare well with the existing literature on Ti films produced using other techniques.File in questo prodotto:
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