The investigation on the interface properties of fcc-CoPt/CoO thin films grown by Pulsed Laser Deposition is presented. The structural and microstructural properties of the CoO antiferromagnetic layer have been modulated by thermal treatments in order to investigate their influence on the magnetic behavior of the system.

Exchange Bias in fcc-CoPt/CoO/Si films as a function of annealing treatment

Laureti S;Agostinelli E;Fiorani D;Testa AM;Varvaro G;Generosi A;Paci B;
2009

Abstract

The investigation on the interface properties of fcc-CoPt/CoO thin films grown by Pulsed Laser Deposition is presented. The structural and microstructural properties of the CoO antiferromagnetic layer have been modulated by thermal treatments in order to investigate their influence on the magnetic behavior of the system.
2009
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
Exchange Bias
fcc-CoPt/CoO/Si films
PLD
annealing treatment
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/23497
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