The investigation on the interface properties of fcc-CoPt/CoO thin films grown by Pulsed Laser Deposition is presented. The structural and microstructural properties of the CoO antiferromagnetic layer have been modulated by thermal treatments in order to investigate their influence on the magnetic behavior of the system.

Exchange Bias in fcc-CoPt/CoO/Si films as a function of annealing treatment

Laureti S;Agostinelli E;Fiorani D;Testa AM;Varvaro G;Generosi A;Paci B;
2009

Abstract

The investigation on the interface properties of fcc-CoPt/CoO thin films grown by Pulsed Laser Deposition is presented. The structural and microstructural properties of the CoO antiferromagnetic layer have been modulated by thermal treatments in order to investigate their influence on the magnetic behavior of the system.
2009
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
46
90
94
http://biblioproxy.cnr.it:2050/science/article/pii/S0749603609000056#
Sì, ma tipo non specificato
Exchange Bias
fcc-CoPt/CoO/Si films
PLD
annealing treatment
8
info:eu-repo/semantics/article
262
Laureti S.; Agostinelli E.; Fiorani D.; Testa A.M.; Varvaro G.; Generosi A.; Paci B.; Rossi Albertini V.
01 Contributo su Rivista::01.01 Articolo in rivista
none
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/23497
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