Silicene, the new allotropic form of silicon, represents an interesting promise for future new nanostructured materials. Here, we investigate the room temperature oxidation of a one-dimensional grating of silicene nanoribbons grown on a Ag(1 1 0) surface by high-resolution Si 2p core level photoemission spectroscopy and low-energy electron diffraction observations. The oxidation process starts at very high oxygen exposures, about 104 times higher than on the clean Si(1 1 1)7 × 7 surface, which demonstrates the low reactivity of silicene to molecular oxygen. Ar+sputtering produces defects, which enhance the oxidation uptake.

Strong resistance of silicene nanoribbons towards oxidation

Quaresima C;Olivieri B;Perfetti P;
2011

Abstract

Silicene, the new allotropic form of silicon, represents an interesting promise for future new nanostructured materials. Here, we investigate the room temperature oxidation of a one-dimensional grating of silicene nanoribbons grown on a Ag(1 1 0) surface by high-resolution Si 2p core level photoemission spectroscopy and low-energy electron diffraction observations. The oxidation process starts at very high oxygen exposures, about 104 times higher than on the clean Si(1 1 1)7 × 7 surface, which demonstrates the low reactivity of silicene to molecular oxygen. Ar+sputtering produces defects, which enhance the oxidation uptake.
2011
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/23604
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