The anisotropy in surface and subsurface ionization due to the primary electron diffraction has been conflictually reported to play a minor or major role in Auger spectroscopy, and the influence of instrumental and physical parameters has been discussed. We report on the effects of incoming beam diffraction on the quantitative analysis of cleaved, sputtered and Cs covered III-V compounds. We show that measurements must be taken into account for crystalline specimen orientation with respect to the incident beam direction.

DIFFRACTION EFFECTS IN AUGER QUANTITATIVE-ANALYSIS ON III-V COMPOUNDS

DIBONA A;
1993

Abstract

The anisotropy in surface and subsurface ionization due to the primary electron diffraction has been conflictually reported to play a minor or major role in Auger spectroscopy, and the influence of instrumental and physical parameters has been discussed. We report on the effects of incoming beam diffraction on the quantitative analysis of cleaved, sputtered and Cs covered III-V compounds. We show that measurements must be taken into account for crystalline specimen orientation with respect to the incident beam direction.
1993
Inglese
70-1
A
20
23
RAY PHOTOELECTRON DIFFRACTION
ELECTRON SPECTROSCOPY
ADSORPTION-KINETICS
SURFACES
GAAS
DAMAGE
EELS
XPS
AES
SESSION ON THE APPLICATIONS OF SURFACE SCIENCE AND ELECTRONIC MATERIALS, AT THE 12TH INTERNATIONAL VACUUM CONGRESS ( IVC-12 ), THE HAGUE, NETHERLANDS, OCT 12-16, 1992
4
info:eu-repo/semantics/article
262
Valeri, S; Dibona, A; Nava, ; E,
01 Contributo su Rivista::01.01 Articolo in rivista
none
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/236435
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