The reversible shift of the TMI of a manganite thin film was obtained by field effect. By taking advantage of the planar side gate geometry as well as of the high dielectric permittivity substrate, it was possible to observe a shift by 1.3 K of TMI, plus a change in resistance by as much as 20%, demonstrating a remarkable modulation capability of charge carrier density.

Reversible shift of the transition temperature of manganites in planar field effect devices patterned by atomic force microscope

IPallecchi;LPellegrino;
2003

Abstract

The reversible shift of the TMI of a manganite thin film was obtained by field effect. By taking advantage of the planar side gate geometry as well as of the high dielectric permittivity substrate, it was possible to observe a shift by 1.3 K of TMI, plus a change in resistance by as much as 20%, demonstrating a remarkable modulation capability of charge carrier density.
2003
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/237972
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