Thin films of Er3+-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O2 pressure (5, 10 Pa) and at different substrate temperatures (RT, 100°C and 200°C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditions
Pulsed Laser Deposition of Er doped tellurite films on large area
A Chiasera;M Ferrari;
2005
Abstract
Thin films of Er3+-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O2 pressure (5, 10 Pa) and at different substrate temperatures (RT, 100°C and 200°C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditionsFile in questo prodotto:
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