The adsorption of germanium on the Bi/Si(001)-(2 × 5) surface [bismuth saturation coverage of 0.7 ML (monolayers)] was investigated by core-level photoemission spectroscopy. At submonolayer germanium coverage, the presence of a bulk component largely dominating the Ge 3d core level demonstrates that the favourite adsorption sites are the bismuth-terminated terraces, where Ge-Bi site exchange takes place. At larger germanium coverage, in addition to the previous process, the occurrence of a pure germanium epitaxy is indicated by the presence of the (2 × 1) surface components in the Ge 3d core level.

Ge/Bi/Si(001)-c(4 × 2) interface studied by high-resolution core-level spectroscopy

De Padova;Pa;Larciprete;Ottaviani;Ca;Priori;Sa;Ca;Perfetti;Pa
1999

Abstract

The adsorption of germanium on the Bi/Si(001)-(2 × 5) surface [bismuth saturation coverage of 0.7 ML (monolayers)] was investigated by core-level photoemission spectroscopy. At submonolayer germanium coverage, the presence of a bulk component largely dominating the Ge 3d core level demonstrates that the favourite adsorption sites are the bismuth-terminated terraces, where Ge-Bi site exchange takes place. At larger germanium coverage, in addition to the previous process, the occurrence of a pure germanium epitaxy is indicated by the presence of the (2 × 1) surface components in the Ge 3d core level.
1999
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
Adsorption
Bismuth
Crystal lattices
Electron energy levels
Epitaxial growth
Germanium
Photoelectron spectroscopy
Semiconducting silicon
Surface structure
High resolution core level spectroscopy
Lattice mismatch
Interfaces (materials)
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/243778
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