The chemical stability of buckled silicene, i.e., the silicon counterpart of graphene, is investigated then resulting in a low reactivity with O 2 when dosing up to 1000 L and in a progressive oxidation under ambient conditions. The latter drawback is addressed by engineering ad hoc Al- and Al 2 O 3 -based encapsulations of the silicene layer. This encapsulation design can be generally applied to any silicene confi guration, irrespective of the support substrate, and it leads to the fabrication of atomically sharp and chemically intact Al/silicene and Al 2 O 3 /silicene interfaces that can be functionally used for ex situ characterization as well as for gated device fabrication.
Hindering the Oxidation of Silicene with Non-Reactive Encapsulation
Alessandro Molle;Carlo Grazianetti;Daniele Chiappe;Eugenio Cinquanta;Elena Cianci;
2013
Abstract
The chemical stability of buckled silicene, i.e., the silicon counterpart of graphene, is investigated then resulting in a low reactivity with O 2 when dosing up to 1000 L and in a progressive oxidation under ambient conditions. The latter drawback is addressed by engineering ad hoc Al- and Al 2 O 3 -based encapsulations of the silicene layer. This encapsulation design can be generally applied to any silicene confi guration, irrespective of the support substrate, and it leads to the fabrication of atomically sharp and chemically intact Al/silicene and Al 2 O 3 /silicene interfaces that can be functionally used for ex situ characterization as well as for gated device fabrication.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
