In this work it is suggested that surface diffusion phenomena, used by some authors(1,2) to explain the initial phase of diamond deposition and nuclei formation, are not so compulsory to explain the observed growth kinetics. A nuclei surface-vapour interface reaction limited process could instead be the phenomenon mainly responsible of the nuclei growth, primarily when strong covalent bonds are formed between the substrate and the nutrient species, like in diamond deposition on Silicon.

: CVD diamond single particle growth, particle size distribution and nuclei interaction in heterogeneous nucleation

1998

Abstract

In this work it is suggested that surface diffusion phenomena, used by some authors(1,2) to explain the initial phase of diamond deposition and nuclei formation, are not so compulsory to explain the observed growth kinetics. A nuclei surface-vapour interface reaction limited process could instead be the phenomenon mainly responsible of the nuclei growth, primarily when strong covalent bonds are formed between the substrate and the nutrient species, like in diamond deposition on Silicon.
1998
Inglese
PROCEEDINGS OF THE FIFTH INTERNATIONAL SYMPOSIUM ON DIAMOND MATERIALS
5th International Symposium on Diamond Materials at the 192nd Meeting of the Electrochemical-Society
97
201
207
AUG 31-SEP 05, 1997
PARIS, FRANCE
1
none
Paolo, Ascarelli
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/251411
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