This work deals with a cobalt-based alloy thin film magnetic concentrator (MC) which is fully integrated on a Hall sensor integrated circuit (IC) developed in the 0.35 ?m Bipolar CMOS DMOS (BCD) technology on 8" silicon wafer. An amorphous magnetic film with a thickness of 1?m, coercitive field Hc<10A/m and saturation magnetization (?0MS) of 0.45T has been obtained with a sputtering process. The Hall sensor IC has shown sensitivity to magnetic field at room temperature of 240V/AT without concentrator and 2550V/AT with concentrator, gaining a factor of 10.5. A current sensor demonstrator has been realized showing linear response in the range -50 to 50A.

Hall current sensor IC with integrated Co-based alloy thin film magnetic concentrator

F Casoli;P Ranzieri;F Albertini;
2013

Abstract

This work deals with a cobalt-based alloy thin film magnetic concentrator (MC) which is fully integrated on a Hall sensor integrated circuit (IC) developed in the 0.35 ?m Bipolar CMOS DMOS (BCD) technology on 8" silicon wafer. An amorphous magnetic film with a thickness of 1?m, coercitive field Hc<10A/m and saturation magnetization (?0MS) of 0.45T has been obtained with a sputtering process. The Hall sensor IC has shown sensitivity to magnetic field at room temperature of 240V/AT without concentrator and 2550V/AT with concentrator, gaining a factor of 10.5. A current sensor demonstrator has been realized showing linear response in the range -50 to 50A.
2013
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Inglese
P. Tiberto, M. Affronte, F. Casoli, C. de Julián Fernández, G. Gubbiotti, C. Marquina, F. Pratt, M. Solzi, S. Tacchi and P. Vavassori
JEMS 2012 - Joint European Magnetic Symposia
Joint European Magnetic Symposia 2012
40
16002-1
4
http://dx.doi.org/10.1051/epjconf/20134016002
Società Italiana di Fisica
EDP Sciences
Springer
Bologna
Les Ulis Cedex
London
ITALIA
FRANCIA
REGNO UNITO DI GRAN BRETAGNA
Sì, ma tipo non specificato
9-14 Settembre 2012
Parma
Conference: 6th Joint European Magnetic Symposia (JEMS); Parma, ITALY; SEP 09-14, 2012 Sponsor(s):CNR, Inst Mat Elect & Magnetism; Univ Parma, Dept Phys & Earth Sci; MaTeck Technologie & Kristalle Gmbh; Springer Verlag Italia; Attocube Syst AG; Cryogen Ltd; IOP Publishing; LakeShore Cryotron Inc; L O T Oriel Italia S r l; NB NanoScale Biomagnet; Oxford Instruments Nanoscience; Tohoku Steel Co Ltd; EPS
3
none
V Palumbo; M Marchesi; V Chiesi; D Paci; P Iuliano; F Toia; F Casoli; P Ranzieri; F Albertini; M Morelli
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/258809
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