The electrical transport properties of c-axis oriented Nd1.85Ce0.15CuO4-? superconducting films have been investigated to analyze the pinning mechanism in this material. The samples were grown on SrTiO3 substrates using the dc sputtering high-pressure technique, whereas a detailed analysis of the structure and local composition of the films has been achieved using high- resolution electron microscopy and x-ray microanalysis. Magneto-resistance and current-voltage measurements, in the temperature range from 1.6 to 300 K and in magnetic field up to 9 T, have been reported. In particular, the anisotropic coefficient defined as the ratio between the parallel upper critical field, ?Hc2 ab, and the perpendicular one, ?Hc2 c, has been evaluated, pointing out the high anisotropy of this compound. Furthermore, the vortex activation energy as a function of the applied magnetic fi ld, parallel and perpendicular to the CuO2 planes, has been derived and compared with the flux-pinning forces to enlighten the peculiar nature of pinning centers in this material.
Pinning mechanism in electron-doped HTS NdCeCuO epitaxial films
A Guarino;A Leo;G Grimaldi;N Martucciello;S Pace;A Nigro
2014
Abstract
The electrical transport properties of c-axis oriented Nd1.85Ce0.15CuO4-? superconducting films have been investigated to analyze the pinning mechanism in this material. The samples were grown on SrTiO3 substrates using the dc sputtering high-pressure technique, whereas a detailed analysis of the structure and local composition of the films has been achieved using high- resolution electron microscopy and x-ray microanalysis. Magneto-resistance and current-voltage measurements, in the temperature range from 1.6 to 300 K and in magnetic field up to 9 T, have been reported. In particular, the anisotropic coefficient defined as the ratio between the parallel upper critical field, ?Hc2 ab, and the perpendicular one, ?Hc2 c, has been evaluated, pointing out the high anisotropy of this compound. Furthermore, the vortex activation energy as a function of the applied magnetic fi ld, parallel and perpendicular to the CuO2 planes, has been derived and compared with the flux-pinning forces to enlighten the peculiar nature of pinning centers in this material.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.