A large-area two-dimensional Thue-Morse quasicrystal with nanometer structures is fabricated on poly-methyl methacrylate (PMMA) substrate using the technology of electron beam lithography (EBL). And the optical properties of sample are studied by the far-field diffraction experiment. In addition, according to the diffraction principle and interference theory, the Fraunhofer diffraction patterns of the Thue-Morse quasicrystal are simulated and analyzed. It is shown that the theoretical simulations are consistent with the experimental results very well.

Fabrication and optical properties of two-dimensional Thue-Morse quasicrystals

Petti Lucia;
2011

Abstract

A large-area two-dimensional Thue-Morse quasicrystal with nanometer structures is fabricated on poly-methyl methacrylate (PMMA) substrate using the technology of electron beam lithography (EBL). And the optical properties of sample are studied by the far-field diffraction experiment. In addition, according to the diffraction principle and interference theory, the Fraunhofer diffraction patterns of the Thue-Morse quasicrystal are simulated and analyzed. It is shown that the theoretical simulations are consistent with the experimental results very well.
2011
Istituto di Scienze Applicate e Sistemi Intelligenti "Eduardo Caianiello" - ISASI
Electron beam lithography
Optical devices
Photonic quasicrystals
The far-field diffraction
Thue-Morse sequence
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/259942
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 2
  • ???jsp.display-item.citation.isi??? ND
social impact