Different designs of the SX-700 plane gratingmonochromator have been investigated for the undulator beamline (51) by using analytical considerations and carrying out ray tracing calculations. The most important modifications of the original design are those where the ellipsoidal focusing mirror has been replaced by a plane elliptical or by a spherical mirror. A significant advantage of the spherical mirror is essentially better figure accuracies (±0.2 arcsec). This is partly compensated by the introduced coma aberration which, however, can be made small with rather long exit arm lengths (5-6 m). If the slope errors of the plane elliptical mirror can be made as small as 0.5 arcsec, the differences in the ultimate resolution are small between the plane elliptical and spherical designs and then the source size is the main factor.

Study of different SX-700 monochromator designs for the undulator beamline (BL51) at MAX-lab

1992

Abstract

Different designs of the SX-700 plane gratingmonochromator have been investigated for the undulator beamline (51) by using analytical considerations and carrying out ray tracing calculations. The most important modifications of the original design are those where the ellipsoidal focusing mirror has been replaced by a plane elliptical or by a spherical mirror. A significant advantage of the spherical mirror is essentially better figure accuracies (±0.2 arcsec). This is partly compensated by the introduced coma aberration which, however, can be made small with rather long exit arm lengths (5-6 m). If the slope errors of the plane elliptical mirror can be made as small as 0.5 arcsec, the differences in the ultimate resolution are small between the plane elliptical and spherical designs and then the source size is the main factor.
1992
Istituto Officina dei Materiali - IOM -
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/262327
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