A molybdenum chloromethoxide was prepared by reaction Of MOCl5 with methanol. By water addition, a sol was obtained that was stable on a month time scale. The sols were characterized by UV-vis and Raman spectroscopy, showing that upon water addition hydrolysis takes place but without extensive condensation, explaining the sol stability. The sol was modified by addition of cetyltrimethylammonium bromide to get deposition of thin films onto silicon substrates. Very uniform, polycrystalline alpha-MoO3 thin films on silicon or polycrystalline powders could be obtained after heat treatment at 350degreesC of the as-deposited film and the evaporated sol, respectively. Fourier transform infrared and X-ray photoelectron spectroscopy studies on the films and powders have shown that, while the films are extensively polymerized after the deposition and chlorine free, the powders evolve with the heating temperature toward the final structure by a stepwise process in which the Mo(IV) and Mo(V) states are progressively oxidized to the final Mo(VI) state. The powders heated at at least 250degreesC are chlorine free. X-ray diffraction patterns measured on thin films and powders show that the films are amorphous up to 250degreesC, while powders begin to crystallize as alpha-MoO3 at such a temperature. These results are supported by thermal analysis on powders. Scanning electron microscopy observations show that the film morphology is initially very smooth while after heating at 500degreesC it is constituted by flat micrometric platelets. The powders heated at 500degreesC show a lamellar structure.

Synthesis and Characterization of MoO 3 Thin Films and Powders from a Molybdenum Chloromethoxide.

Imperatori P;Siciliano P
2004

Abstract

A molybdenum chloromethoxide was prepared by reaction Of MOCl5 with methanol. By water addition, a sol was obtained that was stable on a month time scale. The sols were characterized by UV-vis and Raman spectroscopy, showing that upon water addition hydrolysis takes place but without extensive condensation, explaining the sol stability. The sol was modified by addition of cetyltrimethylammonium bromide to get deposition of thin films onto silicon substrates. Very uniform, polycrystalline alpha-MoO3 thin films on silicon or polycrystalline powders could be obtained after heat treatment at 350degreesC of the as-deposited film and the evaporated sol, respectively. Fourier transform infrared and X-ray photoelectron spectroscopy studies on the films and powders have shown that, while the films are extensively polymerized after the deposition and chlorine free, the powders evolve with the heating temperature toward the final structure by a stepwise process in which the Mo(IV) and Mo(V) states are progressively oxidized to the final Mo(VI) state. The powders heated at at least 250degreesC are chlorine free. X-ray diffraction patterns measured on thin films and powders show that the films are amorphous up to 250degreesC, while powders begin to crystallize as alpha-MoO3 at such a temperature. These results are supported by thermal analysis on powders. Scanning electron microscopy observations show that the film morphology is initially very smooth while after heating at 500degreesC it is constituted by flat micrometric platelets. The powders heated at 500degreesC show a lamellar structure.
2004
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/26491
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