THICK COMPOSITE MAGNETOELECTRIC FILMS PRODUCED BY ELECTROPHORETIC DEPOSITION Pietro Galizia, Carlo Baldisserri, Carmen Galassi CNR-ISTEC, Italy Electrophoretic deposition (EPD) from colloidal suspensions was utilized for the preparation of composite magneto-dielectric films on a conductive substrate. The present process is developed as a convenient forming process for the development of devices based on thick magneto-dielectric films1. The deposition parameters - using EPD - such as colloidal parameters, deposition voltage and deposition time and the post process parameters, such as drying velocity and sintering will be controlled. This work aims to control the fillers/matrix ratio during the deposition and obtain a good adhesion, compaction and functionality of the composite film after the heat treatment. Measurements results for the current transients during constant-voltage deposition and the correlated deposited mass are presented2,3. 1] A.O. Karilainen, P.M.T. Ikonen, C.R. Simovski, S.A. Tretyakov, A.N. Lagarkov, S.A. Maklakov, K.N. Rozanov, and S.N. Starostenko, Experimental studies on antenna miniaturisation using magneto-dielectric and dielectric materials, IET Microw. Antennas Propag., vol. 5, no. 4, pp. 495-502, 2011. 2] C. Baldisserri, D. Gardini and C. Galassi, An analysis of current transients during electrophoretic deposition (EPD) from colloidal TiO2 suspensions, Journal of Colloid and Interface Science 347 (2010) 102-111 3] H. Farnoush, J.A. Mohandesi, D. H. Fatmehsari and F. Moztarzadeh, A kinetic study on the electrophoretic deposition of hydroxyapatite-titania nanocomposite based on a statistical approach, Ceramics International 38 (2012), 6753-6767

THICK COMPOSITE MAGNETOELECTRIC FILMS PRODUCED BY ELECTROPHORETIC DEPOSITION

Pietro Galizia;Carlo Baldisserri;Carmen Galassi
2014

Abstract

THICK COMPOSITE MAGNETOELECTRIC FILMS PRODUCED BY ELECTROPHORETIC DEPOSITION Pietro Galizia, Carlo Baldisserri, Carmen Galassi CNR-ISTEC, Italy Electrophoretic deposition (EPD) from colloidal suspensions was utilized for the preparation of composite magneto-dielectric films on a conductive substrate. The present process is developed as a convenient forming process for the development of devices based on thick magneto-dielectric films1. The deposition parameters - using EPD - such as colloidal parameters, deposition voltage and deposition time and the post process parameters, such as drying velocity and sintering will be controlled. This work aims to control the fillers/matrix ratio during the deposition and obtain a good adhesion, compaction and functionality of the composite film after the heat treatment. Measurements results for the current transients during constant-voltage deposition and the correlated deposited mass are presented2,3. 1] A.O. Karilainen, P.M.T. Ikonen, C.R. Simovski, S.A. Tretyakov, A.N. Lagarkov, S.A. Maklakov, K.N. Rozanov, and S.N. Starostenko, Experimental studies on antenna miniaturisation using magneto-dielectric and dielectric materials, IET Microw. Antennas Propag., vol. 5, no. 4, pp. 495-502, 2011. 2] C. Baldisserri, D. Gardini and C. Galassi, An analysis of current transients during electrophoretic deposition (EPD) from colloidal TiO2 suspensions, Journal of Colloid and Interface Science 347 (2010) 102-111 3] H. Farnoush, J.A. Mohandesi, D. H. Fatmehsari and F. Moztarzadeh, A kinetic study on the electrophoretic deposition of hydroxyapatite-titania nanocomposite based on a statistical approach, Ceramics International 38 (2012), 6753-6767
2014
Istituto di Scienza, Tecnologia e Sostenibilità per lo Sviluppo dei Materiali Ceramici - ISSMC (ex ISTEC)
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/266848
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