Alumina is used as a dielectric in microelectronics. This work describes strategies employed to control the thickness and homogeneity of alumina deposited by spin on casting on silicon substrates. Different parameters (stabilizing additives, hydrolyzing solution and spin in velocity) have been used o widen the process window and control the thickness.

Control of Gelation during the deposition of Alumina Films

Watts;
2014

Abstract

Alumina is used as a dielectric in microelectronics. This work describes strategies employed to control the thickness and homogeneity of alumina deposited by spin on casting on silicon substrates. Different parameters (stabilizing additives, hydrolyzing solution and spin in velocity) have been used o widen the process window and control the thickness.
2014
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
aluminium oxide
additives
thin film
spin coating
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/272477
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