We explored new strategies for efficiency enhancement in dye-sensitized solar cells (DSSCs) by combining dehydration condensation reactions with sputtering deposition methods. The photoanodes were realized by means of low-temperature preparation of mesoporous TiO2 films on thin undoped TiO2 compact (blocking) layers on ZnO:Al (AZO) substrates and sensitization with ruthenium dye, N719. For photoanodes fabrication, an 8 mu m thick mesoporous film of TiO2 and an under critical thermal budget, applied before dye loading (<= 200 degrees C: i.e., 150 degrees C for the TiO2 mesoscopic layer and 200 degrees C for the TiO2 blocking/AZO bilayer), were employed, which renders the overall process competitive for the applications. The structural properties of the sputtered TiO2/AZO bilayer were optimized, and a cell efficiency as high as the 4.6%, above the current literature limit for AZO-based DSSC (3.8% for 10 mu m thick mesoporous layers sintered at 450 degrees C and sensitized with N719), was achieved at T <= 200 degrees C. With the proposed scheme for the photoanode structure and using, instead, a conventional thermal treatment at 500 degrees C (30 s), the cell efficiencies were further raised up to 4.9%. It was thus evidenced that the use of optimized materials for the cell architecture makes the AZO-based DSSC nowadays rising devices.

Efficiency Enhancement in ZnO:Al-Based Dye-Sensitized Solar Cells Structured with Sputtered TiO2 Blocking Layers

Alberti A;Pellegrino G;Bongiorno C;La Magna A;
2014

Abstract

We explored new strategies for efficiency enhancement in dye-sensitized solar cells (DSSCs) by combining dehydration condensation reactions with sputtering deposition methods. The photoanodes were realized by means of low-temperature preparation of mesoporous TiO2 films on thin undoped TiO2 compact (blocking) layers on ZnO:Al (AZO) substrates and sensitization with ruthenium dye, N719. For photoanodes fabrication, an 8 mu m thick mesoporous film of TiO2 and an under critical thermal budget, applied before dye loading (<= 200 degrees C: i.e., 150 degrees C for the TiO2 mesoscopic layer and 200 degrees C for the TiO2 blocking/AZO bilayer), were employed, which renders the overall process competitive for the applications. The structural properties of the sputtered TiO2/AZO bilayer were optimized, and a cell efficiency as high as the 4.6%, above the current literature limit for AZO-based DSSC (3.8% for 10 mu m thick mesoporous layers sintered at 450 degrees C and sensitized with N719), was achieved at T <= 200 degrees C. With the proposed scheme for the photoanode structure and using, instead, a conventional thermal treatment at 500 degrees C (30 s), the cell efficiencies were further raised up to 4.9%. It was thus evidenced that the use of optimized materials for the cell architecture makes the AZO-based DSSC nowadays rising devices.
2014
Istituto per la Microelettronica e Microsistemi - IMM
DSSC
TiO2
Photovoltaics
sputtering
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/273178
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