Two new perylene diimide derivatives N,N'-bis(5-tridecyl-1,3,4-thiadiazol-2-yl) perylene-3,4,9,10-tetracarboxylic 3,4:9,10-diimide (PDI-T1) and N, N'-bis[5-(1-hexyl) nonyl-1,3,4-thiadiazol-2-yl] perylene-3,4,9,10-tetracarboxylic 3,4:9,10-diimide (PDI-T2), achieved by functionalizing the basic perylene molecular core at imide nitrogen with 1,3,4-thiadiazole rings, have been synthesized. Both these compounds make possible the fabrication of n-type organic thin-film transistors able to work in air, even when bare SiO2 surfaces are utilized as gate dielectric. As active channels of transistors in the bottom-contact bottom-gate configuration, PDI-T1 evaporated films exhibited a maximum mobility of 0.016 cm(2)/V s in vacuum. For evaporated PDI-T2 films, instead, mobility values were found to be more than one order of magnitude lower, because of their reduced degree of crystalline order. However, PDI-T2 films can be also deposited by solution techniques and field-effect transistors were fabricated by spin-coating, displaying mobility values ranging between 10(-6) and 10(-5) cm(2)/V s. Similar to what previously found for other perylene diimide derivatives, our experimental work also demonstrates that the electrical response of both PDI-T1 and PDI-T2 transistors under ambient conditions can be improved by increasing the level of hydrophobicity of the dielectric surface. (c) 2012 Elsevier B.V. All rights reserved.
Perylene diimides functionalized with N-thiadiazole substituents: Synthesis and electronic properties in OFET devices
Barra Mario;Cassinese Antonio
2012
Abstract
Two new perylene diimide derivatives N,N'-bis(5-tridecyl-1,3,4-thiadiazol-2-yl) perylene-3,4,9,10-tetracarboxylic 3,4:9,10-diimide (PDI-T1) and N, N'-bis[5-(1-hexyl) nonyl-1,3,4-thiadiazol-2-yl] perylene-3,4,9,10-tetracarboxylic 3,4:9,10-diimide (PDI-T2), achieved by functionalizing the basic perylene molecular core at imide nitrogen with 1,3,4-thiadiazole rings, have been synthesized. Both these compounds make possible the fabrication of n-type organic thin-film transistors able to work in air, even when bare SiO2 surfaces are utilized as gate dielectric. As active channels of transistors in the bottom-contact bottom-gate configuration, PDI-T1 evaporated films exhibited a maximum mobility of 0.016 cm(2)/V s in vacuum. For evaporated PDI-T2 films, instead, mobility values were found to be more than one order of magnitude lower, because of their reduced degree of crystalline order. However, PDI-T2 films can be also deposited by solution techniques and field-effect transistors were fabricated by spin-coating, displaying mobility values ranging between 10(-6) and 10(-5) cm(2)/V s. Similar to what previously found for other perylene diimide derivatives, our experimental work also demonstrates that the electrical response of both PDI-T1 and PDI-T2 transistors under ambient conditions can be improved by increasing the level of hydrophobicity of the dielectric surface. (c) 2012 Elsevier B.V. All rights reserved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.


