In this paper we have determined the role of oxidizing pressure and annealing temperature in the formation of ZnO nanostructures on the Mo surface. ZnO has been grown on Mo(001) by means of physical vapor deposition of Zn in molecular oxygen pressure. Combining STM, XPS, and XRD we have studied the relation between morphology, composition, and structure. ZnO grows as a film with (101¯1) preferential orientation up to a thickness of 10 Å, catalyzed by the Mo surface that provides oxygen available for oxide formation and limited by the residual polarity of the surface. Increasing the deposited amount, the role of the Mo interface becomes less effective, and part of the Zn remains metallic, forming clusters on the surface that catalyze the further growth of ZnO in the form of polycrystalline nanostructures. Surfactant Zn is removed by annealing, and peculiar oxide nanostructures are left on the surface. Increasing O pressure or reducing Zn flux allows control of nanostructure density and shape, while the continuous film underneath does not modify.
ZnO nanostructure formation on the Mo(001) surface
Benedetti S;Di Bona A;Valeri S
2015
Abstract
In this paper we have determined the role of oxidizing pressure and annealing temperature in the formation of ZnO nanostructures on the Mo surface. ZnO has been grown on Mo(001) by means of physical vapor deposition of Zn in molecular oxygen pressure. Combining STM, XPS, and XRD we have studied the relation between morphology, composition, and structure. ZnO grows as a film with (101¯1) preferential orientation up to a thickness of 10 Å, catalyzed by the Mo surface that provides oxygen available for oxide formation and limited by the residual polarity of the surface. Increasing the deposited amount, the role of the Mo interface becomes less effective, and part of the Zn remains metallic, forming clusters on the surface that catalyze the further growth of ZnO in the form of polycrystalline nanostructures. Surfactant Zn is removed by annealing, and peculiar oxide nanostructures are left on the surface. Increasing O pressure or reducing Zn flux allows control of nanostructure density and shape, while the continuous film underneath does not modify.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.