We propose the fabrication at submicron resolution of a patterned thin film of tris(8-hydroxyquinolinato)aluminum(III) (AlQ3) on a SiO/Si surface by modified microtransfer molding. The film is formed during the printing process. In this manner, it is possible to obtain a patterned homogeneous film with nanometer-size features by a single step, with no change to its adhesion and mechanical properties.

Patterning a Conjugated Molecular Thin Film at Submicron Scale by Modified Microtransfer Molding

Murgia M;Biscarini F
2001

Abstract

We propose the fabrication at submicron resolution of a patterned thin film of tris(8-hydroxyquinolinato)aluminum(III) (AlQ3) on a SiO/Si surface by modified microtransfer molding. The film is formed during the printing process. In this manner, it is possible to obtain a patterned homogeneous film with nanometer-size features by a single step, with no change to its adhesion and mechanical properties.
2001
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
Inglese
1
193
195
Sì, ma tipo non specificato
microtransfer
molding
thin fil
patterning
3
info:eu-repo/semantics/article
262
Cavallini, M Corresponding Author; Murgia, M; Biscarini, F
01 Contributo su Rivista::01.01 Articolo in rivista
none
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/29746
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