We show that thin films grown by vacuum sublimation, or formed by melted powders, of semiconductor R-quinquethiophene (T5) exhibit a hierarchical self-affinity organization that spans scales from tens of nanometers to hundreds of micrometers. T5 organization was investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), and optical microscopy. XRD showed that vacuum-evaporated T5 films were characterized by a preferred orientation of the h00 planes parallel to the glass substrate. Melting of the films followed by rapid quenching to room temperature led to the formation of micrometer-sized, single-crystal-like structures, characterized by uniaxially aligned stripes. XRD proved that the meltingquenching process enhanced molecular ordering and increased the size of domains with the molecule’s long axes tilted by about 65° with respect to the substrate plane and piled up side-by-side along parallel columns. AFM measurements on the melt-quenched structures showed that a hierarchical architecture was built by reiteration across multiple length scales of the same recurring motif. Because of the tendency of T5 to form highly crystalline vacuum-evaporated thin films, a field-effect hole mobility comparable to state-of-the-art FET mobility of R-sexithiophene films was reached, without any attempt to optimize deposition conditions.

Multiscale Self-Organization of the Organic Semiconductor r-Quinquethiophene

Melucci M;Gazzano M;Cavallini M;Biscarini F;
2003

Abstract

We show that thin films grown by vacuum sublimation, or formed by melted powders, of semiconductor R-quinquethiophene (T5) exhibit a hierarchical self-affinity organization that spans scales from tens of nanometers to hundreds of micrometers. T5 organization was investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), and optical microscopy. XRD showed that vacuum-evaporated T5 films were characterized by a preferred orientation of the h00 planes parallel to the glass substrate. Melting of the films followed by rapid quenching to room temperature led to the formation of micrometer-sized, single-crystal-like structures, characterized by uniaxially aligned stripes. XRD proved that the meltingquenching process enhanced molecular ordering and increased the size of domains with the molecule’s long axes tilted by about 65° with respect to the substrate plane and piled up side-by-side along parallel columns. AFM measurements on the melt-quenched structures showed that a hierarchical architecture was built by reiteration across multiple length scales of the same recurring motif. Because of the tendency of T5 to form highly crystalline vacuum-evaporated thin films, a field-effect hole mobility comparable to state-of-the-art FET mobility of R-sexithiophene films was reached, without any attempt to optimize deposition conditions.
2003
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
FET
hole mobility
T5 film
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/29747
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