Matrix-assisted pulsed laser evaporation of chemoselective polymers

In this work, matrix-assisted pulsed laser evaporation was applied to achieve gentle deposition of polymer thin films onto surface acoustic wave resonators. Polyepichlorhydrin, polyisobutylene and polyethylenimine were deposited both onto rigid substrates e.g. Si wafers as well as surface acoustic wave devices using a Nd-YAG laser (266 nm, 355 nm, 10 Hz repetition rate). Morphological investigations (atomic force microscopy and optical microscopy) reveal continuous deposited polymer thin films, and in the case of polyethylenimine a very low surface roughness of 1.2 nm (measured on a 40x40 mu m(2) area). It was found that only for a narrow range of laser fluences (i.e. 0.1-0.3 J/cm(2) in the case of polyisobutylene) the chemical structure of the deposited polymer thin layers resembles to the native polymer. In addition, in the case of polyisobutylene it was shown that the irradiation at 355-nm wavelength produces deviations in the chemical structure of the deposited polymer, as compared to its bulk structure. Following the morphological and structural characterization, only a set of well established conditions was used for polymer deposition on the sensor structures. The surface acoustic wave resonators have been tested using the Network Analyzer before and after polymer deposition. The polymer coated surface acoustic wave resonator responses have been measured upon exposure to various concentrations of dimethylmethylphosphonate analyte. All sensors coated with different polymer layers (polyethylenimine, polyisobutylene, and polyepichlorhydrin) show a clear response to the dimethylmethylphosphonate vapor. The strongest signal is obtained for polyisobutylene, followed by polyethylenimine and polyepichlorhydrin. The results obtained indicate that matrix-assisted pulsed laser evaporation is potentially useful for the fabrication of polymer thin films to be used in applications including microsensor industry.