Hafnium oxide doped silica films with ordered mesostructures were produced with hafnium:silicon ratios between 1:60 and 1:6. A surfactant-hafnium alkoxide complex was synthesized and used as a template in a sol-gel dip-coating process. Face-centred orthorhombic, 2D centred rectangular and lamellar films were formed by evaporation-induced self-assembly (EISA). The influence of subsequent heat treatment was studied by GISAXS and TEM. The surface and in-depth molecular composition of the films was studied by XPS
Hafnium Oxide Doped Mesostructured Silica Films
2007
Abstract
Hafnium oxide doped silica films with ordered mesostructures were produced with hafnium:silicon ratios between 1:60 and 1:6. A surfactant-hafnium alkoxide complex was synthesized and used as a template in a sol-gel dip-coating process. Face-centred orthorhombic, 2D centred rectangular and lamellar films were formed by evaporation-induced self-assembly (EISA). The influence of subsequent heat treatment was studied by GISAXS and TEM. The surface and in-depth molecular composition of the films was studied by XPSFile in questo prodotto:
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