Cholesteryl polysulfides derivatives, containing a number of sulfur atoms comprised from 2 to 6 and suitable for the formation of self-assembled monolayer have been prepared utilizing a known procedure modified by us. The compounds were isolated and characterized by HPLC-MS, H-1 NMR, FT-IR techniques. Self-assembly methodology was adopted in order to obtain uniform layers and the patterning suitability was tested with microcontact printing technique. Contact angle measurements and atomic force microscopy revealed interesting surface modifications
Use of cholesteryl polysulfides in self-assembly and soft lithography on Au(1 1 1) and ITO
Giuseppe Ciccarella;Laura Blasi;Dario Pisignano;Rosaria Rinaldi
2005
Abstract
Cholesteryl polysulfides derivatives, containing a number of sulfur atoms comprised from 2 to 6 and suitable for the formation of self-assembled monolayer have been prepared utilizing a known procedure modified by us. The compounds were isolated and characterized by HPLC-MS, H-1 NMR, FT-IR techniques. Self-assembly methodology was adopted in order to obtain uniform layers and the patterning suitability was tested with microcontact printing technique. Contact angle measurements and atomic force microscopy revealed interesting surface modificationsFile in questo prodotto:
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