In the present work Titanium Dioxide thin films were successfully prepared both on FTO and (1 0 0) Silicon substrates by means of radiofrequency plasma sputtering technique. AFM, XRD, SEM and contact angle measurements were performed in order to characterize the samples. XRD measurements revealed a crystalline structure for all the samples, with a mean globular size in the range of 20 - 30 nm. All samples showed a reversible hydrophilic behavior due to UV irradiation, that can be correlated with their photocatalytic properties.
Characterization of Titanium Dioxide thin films produced by RF plasma sputtering technique for photocatalytic applications
G Angella;R Caniello;M Canetti;M Pedroni;E Vassallo
2015
Abstract
In the present work Titanium Dioxide thin films were successfully prepared both on FTO and (1 0 0) Silicon substrates by means of radiofrequency plasma sputtering technique. AFM, XRD, SEM and contact angle measurements were performed in order to characterize the samples. XRD measurements revealed a crystalline structure for all the samples, with a mean globular size in the range of 20 - 30 nm. All samples showed a reversible hydrophilic behavior due to UV irradiation, that can be correlated with their photocatalytic properties.File in questo prodotto:
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