We demonstrate that the microstructure and electrical properties of Ge2Sb2Te5 films can be changed by a nanoscale mechanical process. Nanoscratching is used to define modified areas onto an as-deposited crystalline Ge2Sb2Te5 film. Scanning tunneling microscopy measurements show that the modified areas have a very low electrical conductivity. Micro-Raman measurements indicate that the mechanically induced microstructural changes are consistent with a phase transformation from crystalline to amorphous, which can be reversed by laser irradiation. (C) 2012 American Institute of Physics. [doi: 10.1063/1.3673592]

Nanoscale mechanically induced structural and electrical changes in Ge2Sb2Te5 films

Cecchini R;
2012

Abstract

We demonstrate that the microstructure and electrical properties of Ge2Sb2Te5 films can be changed by a nanoscale mechanical process. Nanoscratching is used to define modified areas onto an as-deposited crystalline Ge2Sb2Te5 film. Scanning tunneling microscopy measurements show that the modified areas have a very low electrical conductivity. Micro-Raman measurements indicate that the mechanically induced microstructural changes are consistent with a phase transformation from crystalline to amorphous, which can be reversed by laser irradiation. (C) 2012 American Institute of Physics. [doi: 10.1063/1.3673592]
2012
chalcogenide
thin film
nanoscratching
nanoindentation
phase change memory
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/308786
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